Laboratory for Spin-Orbitronic Devices
Stories of professor Sanghoon Kim and his members
Facility

UHV sputtering system
Specification
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Main chamber, Load lock chamber
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8 sputtering sources in main chamber
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Base pressure: 10 X 10 ^-9 Torr
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In-situ annealing temperature up to 800~900℃

Ion - Milling system
Specification
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Base Pressure: 10 X 10^-7
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2 Sputtering Gun
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Gridded ion source
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RF(0.6kW), DC(1kW) Power
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Mask aligner
Specification
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PR solution (AZ GXR 601 [Positive])
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Spin coating

XRD
Specification
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To be updated

Harmonic measurement system
Specification
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~2T Magnetic Field (VOLTA)
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~1.5T Magnetic Field (VOLTI)
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Current and voltage biasing available
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In-plane/out-of-plane rotation
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vertical-axis rotation
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Low T FMR measurement
Specification
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~1.5K
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~9T Magnetic Field
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Sample rotation available

Electrical Measurement System
System Overview
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The FMR Kit enables precise characterization of magnetic dynamics in ferromagnetic thin films and nanostructures.
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MOKE
System Overview
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The MOKE measurement system analyzes the magnetic properties of a sample by detecting polarization changes in reflected laser light. It consists of a laser source, optical components, a magnetic field unit, and detectors to measure magnetic hysteresis.
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NV Center Measurement System
(Planned)
System Overview
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The NV Center Measurement System probes magnetic and quantum properties by optically detecting spin states of nitrogen-vacancy centers in diamond.
